Engineering of metal-MoS2 contacts to overcome Fermi level pinning

Fermi level pinning (FLP) in metal-MoS₂ contacts induces large Schottky barrier heights which in turn results in large contact resistances. In this work, we made use of Density Functional Theory (DFT) to study the origin of FLP in MoS₂ contacts with a variety of metals. We also reported how the Fermi level de-pinning could be attained by controlling the distance between the metal and MoS₂. In this respect, the metal-MoS₂ contacts can be engineered by means of the insertion of proper buffer layers and the use of back-gated structures. This results in a practically zeroed Schottky barrier heights for some specific metal-MoS₂ stacks, which it is crucial to attain Ohmic contacts with low series resistances.

 P.Khakbaz, F.Driussi, P.Giannozzi, A.Gambi, D.Lizzit, D.Esseni

Fermi level pinning (FLP) in metal-MoS2 contacts induces large Schottky barrier heights which in turn results in large contact resistances. In this work, we made use of Density Functional Theory (DFT) to study the origin of FLP in MoS2 contacts with a variety of metals. https://air.uniud.it/bitstream/11390/1224870/2/SSE_rev_Final.pdf

© 2022, The Author(s)
 

https://doi.org/10.1016/j.sse.2022.108378